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© 2008 All Rights Reserved aurora technology consultants limited registration number 6518118
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aurora technology consultants limited
gas vacuum plasma
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aurora can call upon many decades of experience in vacuum technology and vacuum system optimisation including detailed modelling of system out-gassing and pump down, partial pressure sensors and control of process harming contamination.
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The key process harming contaminants of a typical vacuum process are one, or more, of moisture, oxygen and hydrocarbons. Pump down and system out-gassing play a major roll in determining the eventual partial pressure distribution of these contaminants. Vacuum system modelling and the correct choice of materials can significantly improve vacuum performance and hence process productivity. aurora can provide:-

     Distributed outgas modelling - helps optimise vacuum system design including placement of pumping ports, partial pressure sensors etc.

     Pump down optimisation - often a combination of pumping and purging achieves a faster ultimate vacuum than pumping alone.

     Partial pressure sensors - advice on the correct vacuum sensor to use to monitor system contamination from RGAs to discrete specific sensors that operate in vacuum.
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Distrubuted outgass calculation
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Example of a distributed outgassing calculation (H2O partial pressure) for a vacuum chamber with a solid block suspended inside the chamber. The left face of the chamber is a cryopanel.

 

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